Three-Mask Lithography-Based Compliant Interconnects Patent
Submitted by Caspar_admin on Fri, 07/12/2013 - 21:35Provisional Patent, "Three-Mask Lithography-Based Compliant Interconnects for Microelectronic Applications", G. Lo, Q. Zhu, L. Ma, and S. K. Sitaraman, Filed in 2004, Based on Invention Disclosure #3166.
type:
Provisional Patent
Year:
2 004